Maskless lithography enables nanopatterning at will, without the need for slow and expensive photomask. This convenience is especially useful for research and rapid prototyping use. Our system compliments the existing benefits by bringing it to the desktop without any compromise in performance. 瑆创科技开发的无掩模紫外光刻机可以设计任何您想要的纳米图形，而无需昂贵的光刻板。瑆创科技的这款产品能在实现优越的光刻性能的同时，保证低成本以及更便捷的用户体验。
The Beam Engine focuses a UV laser beam into a diffraction-limited spot and scans the spot to expose any arbitrary pattern on a photoresist. To expose large wafers, precision steppers move the wafer and allows multiple exposures to be stitched. The Beam Engine is capable of producing features smaller than (CD) 0.8µm across a 5” wafer.
光束引擎将紫外激光束聚焦到衍射极限点并曝光光刻胶上的任何图案。对大尺寸晶圆，设备能实现精准的步进式光刻。光束引擎具有能够在 5 英寸晶圆上产生小于 (CD) 0.8µm 的特征。
* We have a new option for you now - the BEAM Lite. At a lower price, you can get the best-fitting product. Contact us for more details. * 瑆创新推出的Beam Lite，可以根据需要自由组合，为用户带来更灵活更实惠的最优选项。请即联系我们获取最新资讯。
Compact 袖珍 Full-featured maskless lithography, smaller than a desktop computer. 全功能无掩模光刻机，比台式电脑还小，价格更实惠。 Powerful 强大
Sub-micron resolution while exposes a writefield in less than two seconds. 拥有亚微米分辨率，在不到两秒的时间内完成一个曝光图案的写入。 Ultrafast Autofocus 超快自动对焦
Piezo actuators reach focus in less than a second when combined with our closed-looped focus optics. 当与我们的闭环聚焦光学器件结合使用时，压电致动器在不到一秒的时间内完成聚焦。 No-fuss Multilayer 毫不费力的多层对齐Semi-automatic alignment allows multilayer alignment to be completed within minutes. 几分钟内实现半自动多层对准。 |